Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom
US6274293A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 28, 1998 |
| Grant date | Aug 14, 2001 |
| Priority date | — |
| Expiry date | May 28, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y20/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of manufacturing a flexible metallic photonic band gap structure operable in the infrared region, comprises the steps of spinning on a first layer of dielectric on a GaAs substrate, imidizing this first layer of dielectric, forming a first metal pattern on this first layer of dielectric, spinning on and imidizing a second layer of dielectric, and then removing the GaAs substrate. This method results in a flexible metallic photonic band gap structure operable with various filter characteristics in the infrared region. This method may be used to construct multi-layer flexible metallic photonic band gap structures. Metal grid defects and dielectric separation layer thicknesses are adjusted to control filter parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.