Stamp plate producing apparatus for producing stamp plate used in a stamp device
US6276272A · kind A · utility
9Cited by
13References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 26, 1997 |
| Grant date | Aug 21, 2001 |
| Priority date | — |
| Expiry date | Sep 26, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41K1/50
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Disclosed is the stamp device 11 in which the average pore diameter of the porous base plate used for the stamp plate 1 and the processed stamp plate 10 is set in a range of 10 .mu.m-40 .mu.m, the hardness of the stamp surface 2 is set in a range of 20.degree.-50.degree., the thickness of the porous base plate is set in a range of 1 mm-4 mm, and the annealing temperature of the porous base plate is set in a range of 40.degree. C.-60.degree. C., thereby various stamping characteristics are improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.