Composition for bottom reflection preventive film and novel polymeric dye for use in the same
US6277750A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2000 |
| Grant date | Aug 21, 2001 |
| Priority date | — |
| Expiry date | Jun 27, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
As a bottom anti-reflective coating material for use in photolithography, polymer dyes represented by following general formula are used. The polymer dyes are able to form a bottom anti-reflective coating having good film formation properties, good absorption properties at exposure wavelength, good step coverage, non-intermixing with photoresist and high etch rate. ##STR1## wherein PA0 R represents H or a substituted or non-substituted alkyl, cycloalkyl, or aryl group, R.sup.1 represents a substituted or non-substituted alkyl or aryl, or a --COOR.sup.3 group in which R.sup.3 represents an alkyl group, R.sup.2 represents a substituted or non-substituted alkyl, cycloalkyl, or aryl group, D is an organic chromophore which absorbs at the exposure wavelength (150-450 nm) and represents a substituted or non-substituted aryl, condensed aryl, or heteroaryl group, m and o are any integer above zero, and n, p and q are any integer including zero.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.