Continual flow rapid thermal processing apparatus and method
US6281479A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2000 |
| Grant date | Aug 28, 2001 |
| Priority date | — |
| Expiry date | Jul 11, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67745
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A rapid thermal processing apparatus and a method of using such apparatus for the continuous heat treatment of at least one workpiece, which apparatus includes a cavity of generally elongated shape, a process chamber defined by interior walls inside the cavity, a device for delivering, regulating and extracting process gases from the chamber, a device for transporting at least one workpiece through the chamber in a substantially forward direction, a device for heating at least a section of the chamber, and a device for cooling the at least one workpiece downstream from the heating device. The cavity for the apparatus may also be provided in either a curved or a linear configuration for carrying out the present invention method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.