Patent · US Expired

Electron beam irradiation of gases and light source using the same

US6282222A · kind A · utility

46Cited by

5References

18Claims

0Family size

Assignee

Rutgers, the State University · US

Inventors

Jochen Wieser · Munich, DE
Andreas Ulrich · Bremen, DE
Daniel E. Murnick · Bernardsville, US
Werner Krotz · Munich, DE

Key dates

Filing date	Sep 3, 1999
Grant date	Aug 28, 2001
Priority date	—
Expiry date	Sep 3, 2019

Classification

Technology area (CPC H)Electricity
CPC primaryH01S3/225
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Excimers are generated by directing an electron beam at about 5 KeV to about 40 KeV into an excimer forming gas such as He, Ne, Ar, Kr, and Xe or mixtures of these with other gases through a ceramic foil such as SiN.sub.x. Vacuum ultraviolet (VUV) light is emitted by the excimers or by other species in contact therewith. The invention can provide intense, continuously operable broadband or monochromatic VUV light sources.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.