Method and apparatus for step and repeat exposures
US6285001A · kind A · utility
131Cited by
36References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 5, 1997 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | May 5, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K26/066
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An excimer laser projection ablation system provides less than the necessary amount of illumination to a substrate to completely ablate a structure. The system then moves the substrate a distance less than the image field at the substrate and provides an additional level of illumination. The system continues to move the substrate and provide additional illumination until the structures are fully ablated. The method and system for performing an improved step and repeat process preferably are used to create uniform repeating structures or three-dimensional structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.