Holographic patterning method and tool for production environments
US6285817A · kind A · utility
11Cited by
22References
28Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 17, 2000 |
| Grant date | Sep 4, 2001 |
| Priority date | — |
| Expiry date | Apr 17, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2209/0223
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high resolution, high-throughout, large field size, production environment, lithographic tool system and method includes an interferometric pattern generator utilizing three or four mutually coherent optical beams organized in a flexible beam expansion, filtering, aperturing, and delivery system, large area pattern uniformity is attained via optimized illumination beam positioning and shaping. A passive stabilization system achieves fully modulated interferometric patterns in high mechanical and acoustical vibration manufacturing environments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.