Method for treatment of semiconductor substrate with chemical solution and apparatus used for said treatment
US6286526A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 1998 |
| Grant date | Sep 11, 2001 |
| Priority date | — |
| Expiry date | Dec 2, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The concentrations of predetermined components of a chemical solution 5 present in a cleaning bath 1 are measured by a measurement unit 11. From the results are calculated the concentrations of various chemical species. From the concentrations calculated and an experimentally obtained rate equation is calculated the treating ability of the chemical solution 5 before supplementation of said components. Then, the treating abilities of chemical solution when the components and ultrapure water are supplemented, are calculated for various cases of amounts supplemented. From these cases is determined a case of amounts supplemented in which the treating ability of chemical solution is maintained at a required level and the amounts supplemented are minimized. Next, the components and ultrapure water are supplemented in respective determined amounts via feeding pumps 21, 23 and 25.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.