Wafer carrier rinsing mechanism
US6287178A · kind A · utility
14Cited by
5References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 20, 1999 |
| Grant date | Sep 11, 2001 |
| Priority date | — |
| Expiry date | Jul 20, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/34
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A carrier rinse unit comprising a plurality of nozzles prepositioned to eject a cleaning fluid against a surface of a wafer while the wafer is rotated within a wafer carrier. The prepositioned nozzles may be angled to spray a leading edge, a trailing edge, an outer edge of the wafer, or any desired point on the surface of the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.