Electron-emitting apparatus and image-forming apparatus
US6288494A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 25, 2000 |
| Grant date | Sep 11, 2001 |
| Priority date | — |
| Expiry date | Feb 25, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/3165
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron-emitting apparatus according to the present invention comprises (A) a substrate, which has a first major surface and a second major surface that are positioned opposite each other, (B) an electron-emitting device, which includes a first electrode, to which a first voltage is applied, and a second electrode, to which a voltage Vf is applied, that are mounted, with an intervening interval, on the first major surface, (C) an anode electrode, which is located opposite and at a distance H from the first major surface, (D) first voltage application means, for applying to the second electrode the voltage Vf that is higher than the first voltage, and (E) second voltage application means, for applying to the anode electrode a voltage Va that is higher than the voltage Vf, PA1 wherein a space defined between the anode electrode and the electron-emitting device is maintained in a reduced-pressure condition, and PA1 wherein, when a value Xs=H*Vf/(.pi.*Va) is established for a plane that is substantially perpendicular to the first major surface, a width w of the second electrode, in a direction substantially parallel to the first major surface, equals or exceeds 0.5 times the value …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.