Method for fabricating an electron-emissive film
US6290564A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 30, 1999 |
| Grant date | Sep 18, 2001 |
| Priority date | — |
| Expiry date | Sep 30, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/30469
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for fabricating an electron-emissive film (100) includes the steps of providing a powder (124), which has a plurality of carbon nanotubes (104); providing a substrate (102), a surface (103) of which defines a plurality of interstices (107); and dry spraying powder (124) onto surface (103) of substrate (102). The adjustable parameters of the dry spraying step include a separation distance of a spray nozzle (120) from surface (103), a spray angle between a spray (121) and surface (103), and a nozzle pressure at an opening (123) of spray nozzle (120). The separation distance, spray angle, and nozzle pressure are selected to achieve, for example, uniformity of electron-emissive film (100) and adhesion of carbon nanotubes (104) to substrate (102). They can also be selected to achieve a perpendicular orientation of a length-wise axis (105) of each of carbon nanotubes (104) with respect to surface (103) and to achieve the break down of aggregates of carbon nanotubes (104), so that carbon nanotubes (104) are deposited on substrate (102) substantially as individually isolated carbon nanotubes (104).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.