Patent · US Expired

Compositions for the stripping of photoresists in the fabrication of integrated circuits

US6291410A · kind A · utility

1Cited by
4References
11Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 24, 2000
Grant dateSep 18, 2001
Priority date—
Expiry dateApr 24, 2020

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/426
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

For the stripping of photoresists, the invention proposes to use a mixture of dimethyl sulphoxide DMSO) or N-methylpyrrolidone (NMP) and 3-methoxypropylamine (MOPA). Advantageously, a little water and a corrosion inhibitor, such as sodium tolyltriazolate, are added to the mixture.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.