Device for producing oxidic thin films
US6294025A · kind A · utility
16Cited by
16References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 7, 1998 |
| Grant date | Sep 25, 2001 |
| Priority date | — |
| Expiry date | Dec 7, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T50/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to an apparatus for the production of thin oxide coatings, having a vacuum chamber wherein an oxygen chamber with an opening and a rotary substrate holder overlapping the latter are disposed. For the rotary arrangement of the substrate holder a rotary mounting is provided, which engages a circumferential portion of the substrate holder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.