Lithographic printing plate having high chemical resistance
US6294311A · kind A · utility
68Cited by
8References
52Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 22, 1999 |
| Grant date | Sep 25, 2001 |
| Priority date | — |
| Expiry date | Dec 22, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41C2210/262
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Imageable elements useful as lithographic printing members are disclosed. The elements contain a substrate, an underlayer, and a top layer. The underlayer contains a combination of polymeric materials that provides resistance both to fountain solution and to aggressive washes, such as a UV wash. The underlayer can be used in either thermally imageable or photochemically imageable elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.