Pattern forming body, pattern forming method, and their applications
US6294313A · kind A · utility
87Cited by
4References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 8, 1999 |
| Grant date | Sep 25, 2001 |
| Priority date | — |
| Expiry date | Apr 8, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.