Process pressure measurement devices with improved error compensation
US6295875A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 1999 |
| Grant date | Oct 2, 2001 |
| Priority date | — |
| Expiry date | May 14, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L13/025
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device and method are able to compensate for diaphragm deformation (offset) and varying dielectric constants present in a process field environment. The device can be implemented as a pressure sensor or a transmitter having a pressure sensor. The pressure sensor, filled with a dielectric fill-fluid, includes at least three capacitor plates, disposed about a diaphragm. At least two capacitor plates are placed on one side of a conductive diaphragm, and are arranged in a particular manner with respect to the diaphragm. At least one capacitor plate is placed on the other side of the diaphragm. The method compensates for both diaphragm offset and variances in the dielectric constant of the fill-fluid. An error compensated measurement of differential pressure is a function of the amount of diaphragm deflection detected at the edge region subtracted from the amount of diaphragm deflection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.