Patent · US Expired

Method and system for manufacturing a photocathode

US6296547A · kind A · utility

3Cited by
12References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 16, 1999
Grant dateOct 2, 2001
Priority date
Expiry dateNov 16, 2019

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B37/04
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A system (10) for manufacturing a photocathode includes a support (12) and a polishing pad (14) disposed adjacent the support (12). The polishing pad (14) is operable to polish the photocathode in response to movable contact of the photocathode relative to the polishing pad (14). The system (10) also includes a rinsing system (16) coupled to the support (12). The rinsing system (16) is operable to deliver a rinsing agent to the polishing pad (14). The system (10) further includes a control system (62) operable to automatically regulate delivery of the rinsing agent to the rinsing system (16) at a predetermined time period.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.