Protection of semiconductor fabrication and similar sensitive processes
US6296806A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1997 |
| Grant date | Oct 2, 2001 |
| Priority date | — |
| Expiry date | Dec 23, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/173845
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A detection system for detecting base contamination at low concentrations in gas, for instance to protect a sensitive process, characterized in that the detection system is constructed to examine multiple amines in gas to produce a reading stoichiometrically related to the proton bonding characteristic of the multiple amines present, the detection system comprising at least two channels through which a gas to be examined passes, an amines remover located in one of the channels, at least one thermal/catalytic converter which discharges NO for each channel, and at least one chemiluminescent NO detector, whereby the total amine concentration is determined from the difference between the detected signals for the channels.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.