Patent · US Expired

Process for the aqueous purification of hydrogen peroxide containing impurities

US6296829A · kind A · utility

14Cited by
4References
34Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 15, 1999
Grant dateOct 2, 2001
Priority date
Expiry dateOct 15, 2019

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B15/0135
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Process for purifying an aqueous hydrogen peroxide solution containing impurities, some of which are in ionic form, in which the said aqueous solution is purified by passing it through at least one first resin of anionic type in order to remove at least some anionic impurities, and then through a second resin of cationic type in order to remove at least some of the cationic impurities, or vice versa, characterized in that at least a first and a second bed of a first resin of anionic type are arranged in parallel, in that the aqueous solution is directed alternately onto the said first or the said second bed, and in that changeover from the first bed to the second bed (or vice versa) is carried out when the said first [lacuna] is at least partially saturated with at least one of the anions constituting the anionic impurities.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.