Film or coating deposition on a substrate
US6296910A · kind A · utility
13Cited by
8References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 24, 1999 |
| Grant date | Oct 2, 2001 |
| Priority date | — |
| Expiry date | Nov 24, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C4/123
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of depositing a material onto a substrate, comprising the steps of: feeding a material solution to an outlet to provide a stream of droplets of the material solution; applying a potential difference between the outlet and a substrate to electrostatically attract the droplets from the outlet towards the substrate such that a corona discharge is formed around the outlet; heating the substrate to provide an increase in temperature between the outlet and the substrate; and progressively increasing the temperature of the substrate during material deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.