Electrode formation process
US6299785A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 22, 1999 |
| Grant date | Oct 9, 2001 |
| Priority date | — |
| Expiry date | Apr 22, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/0156
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A process for the preparation of an electrode, which comprises: (1) transferring a conductive paste layer supported on a base film to a substrate to form the conductive paste layer on the substrate; (2) forming a resist film on the conductive paste layer transferred to the substrate; (3) exposing the resist film through a mask to form a resist pattern latent image; (4) developing the exposed resist film to form a resist pattern; (5) etching exposed portions of the conductive paste layer to form a conductive paste layer pattern corresponding to the resist pattern; and (6) thermosetting the pattern to form a conductive layer pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.