Patent · US Expired

Process and apparatus for producing pressurized oxygen and krypton/xenon by low-temperature fractionation of air

US6301929A · kind A · utility

5Cited by
4References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 1, 1999
Grant dateOct 16, 2001
Priority date
Expiry dateDec 1, 2019

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF25J2235/50
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The process and the apparatus serve for producing pressurized oxygen and krypton/xenon by low-temperature fractionation of air. The rectifying system has a low-pressure column (3) for the nitrogen-oxygen separation and a krypton-xenon enrichment column (15). Compressed and prepurified feed air (4) is introduced into the rectifying system. A first oxygen fraction (11) is taken off from the low-pressure column (3), brought (12) to an elevated pressure in the liquid state, vaporized and removed as gaseous pressurized oxygen product (24). In addition, a second oxygen fraction (16) is taken off from the low-pressure column (3) and passed (18) into the lower or central region of the krypton-xenon enrichment column (15). The first oxygen fraction (11) is taken off at least one actual or theoretical plate above the bottom of the low-pressure column (3) and, after the pressure elevation (12) is introduced (14) in the liquid state into the upper region of the krypton-xenon enrichment column (15). A krypton-enriched and/or xenon-enriched fraction (19) is taken off from the lower region of the krypton-xenon enrichment column (15). The pressurized oxygen product (24) is withdrawn in the gaseous…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.