Patent · US Expired

Method of making profiled retroreflective marking material

US6303058A · kind A · utility

17Cited by
78References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 30, 1998
Grant dateOct 16, 2001
Priority date
Expiry dateOct 30, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S264/78
  • WIPO fieldCivil engineering
  • WIPO sectorOther fields

Abstract

A method of making a retroreflective article comprising on the top surface thereof a retroreflective sheet that comprises a monolayer of retroreflective elements wherein first portions of the monolayer are arranged in a contoured profile and second portions of the monolayer are arranged a substantially planar position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.