Quartz glass component for a reactor housing a method of manufacturing same and use thereof

US6306489A · kind A · utility

Assignee

• HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

• Dietmar Hellmann · Gelnhausen, DE
• Johann Leist · Schongau, DE

Key dates

• Filing date: Dec 18, 1998
• Grant date: Oct 23, 2001
• Expiry date: Dec 18, 2018

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24999
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A quartz glass component for a reactor chamber, especially of a plasma etching device, comprises a substrate of a first quartz glass quality with an inner surface having an average roughness depth R.sub.a of more than 1 .mu.m, facing the inside of the reactor. To minimize particles in the reactor chamber, and to give the inner surface high adhesiveness for layers deposited on it and a long service life, a roughness zone is formed on the substrate by an open pore bubble layer made of a second quartz glass quality. The quartz glass component may be made by forming a blank from a granulate containing SiO.sub.2, and partial or complete vitrification of the blank by heating to a temperature above 1,000.degree. C. During the forming of the inner surface of the blank, an additional constituent is added to the granulate containing siO.sub.2 in a roughness zone. The additional constituent reacts during the vitrification to release a gas, which forms a bubble layer during vitrification of the roughness zone.