Polarized light exposure systems for aligning liquid crystals
US6307609A · kind A · utility
Inventors
Key dates
| Filing date | Apr 29, 1998 |
| Grant date | Oct 23, 2001 |
| Priority date | — |
| Expiry date | Apr 29, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to an optical exposure system that is useful for exposing optical alignment layers with light in order to align liquid crystal. The exposure system comprises at least one source of optical radiation, means for partially collimating the optical radiation, means for partially polarizing the optical radiation, means for adjusting the degree of polarization, and means for transporting a substrate and radiation relative to one another. Other embodiments include means for partially filtering the optical radiation and means for some portion of said optical radiation to be incident at an oblique angle relative to the substrate. Another embodiment is a novel optical module and processes for aligning liquid crystals using the optical exposure systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.