Patent · US Expired

Optical system, in particular projection-illumination unit used in microlithography

US6307688A · kind A · utility

75Cited by

7References

9Claims

0Family size

Assignee

Carl Zeiss Stiftung · DE

Inventors

Erich Merz · Oberkochen, DE
Jochen Becker · Oberkochen, DE

Key dates

Filing date	Nov 22, 1999
Grant date	Oct 23, 2001
Priority date	—
Expiry date	Nov 22, 2019

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system, in particular for projection-illumination units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element 1, in particular a lens or a mirror, which is arranged in a mount 7 or an inner ring 2, and actuators 8a, 8b and 9a, 9b. A plurality of actuators 8a, 8b and 9a, 9b act on the deformable inner ring 2 via a radial force-displacement transmission 12, 13 in order to generate tensile and/or compressive forces.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.