Vapor deposition apparatus
US6309466A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2000 |
| Grant date | Oct 30, 2001 |
| Priority date | — |
| Expiry date | Feb 17, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/042
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for vapor depositing a release agent on a foil. The foil is wrapped around a cylindrical drum which is made of a porous material. The hollow inside of the drum forms a vapor space. The outer surface of the drum includes a thin metallic layer which has engraved or etched therein a pattern of surface passages. A vaporizer vessel provides a vaporized release agent which is conducted to the vapor space inside the drum. The release agent travels through the circumferential passages so as to be deposited in a pattern on the foil which is wrapped around the drum. A conforming body covers the circumferential surface not covered by the foil and can be heated to heat the drum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.