Release surfaces, particularly for use in nanoimprint lithography
US6309580A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 30, 1998 |
| Grant date | Oct 30, 2001 |
| Priority date | — |
| Expiry date | Jun 30, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/887
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula: EQU RELEASE-M(X).sub.n-1 -- EQU RELEASE-M(X).sub.n-m-1 Q.sub.m, or EQU RELEASE-M(OR).sub.n-1 --, wherein PA1 RELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or non-polar properties; PA1 M is a metal atom, semiconductor atom, or semimetal atom; PA1 X is halogen or cyano, especially Cl, F, or Br; PA1 Q is hydrogen or alkyl group; PA1 m is the number of Q groups; PA1 R is hydrogen, alkyl or phenyl, preferably hydrogen or alkyl of 1 to 4 carbon atoms; and; PA1 n is the valence -1 of M, PA1 and n-m-1 is at least 1 provides good release properties. The coated substrates are particularly good for a lithographic method and apparatus for creating ultra-fine (sub-25 nm) patterns in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.