Lithographical process for production of nanostructures on surfaces

US6309798A · kind A · utility

Assignee

• Studiengesellschaft Kohle gGmbH · DE

Inventors

• Manfred T. Reetz · Mülheim an der Ruhr, DE
• Martin Winter · Mülheim an der Ruhr, DE
• Gunter Dumpich · Duisburg, DE
• Jens Lohau · Duisburg, DE

Key dates

• Filing date: Nov 5, 1998
• Grant date: Oct 30, 2001
• Expiry date: Nov 5, 2018

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/3175
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A lithographic method for the generation of nanostructures on surfaces, characterized in that either stabilized nanometer-sized transition metal clusters or colloids of metals of groups 4, 5, 6, 7, 8, 9, 10, 11 or 12 of the Periodic Table, their stabilized metal oxide or metal sulfide analogues, polynuclear metal carbonyl clusters having stoichiometrically defined compositions, or polynuclear metal clusters having stoichiometrically defined compositions or having bridges consisting of main group elements, respectively in the form of a solution, are coated on a surface as a film which is imagewise exposed with an electron beam, wherein defined structures in the nanometer range are generated on the surface after washing off the unexposed portions of the film, optionally followed by annealing.