Use of glass laminate as a substrate in semiconductor devices
US6309901A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2000 |
| Grant date | Oct 30, 2001 |
| Priority date | — |
| Expiry date | Apr 18, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for making a semiconductor device is disclosed which comprises the step of applying a functional layer on a substrate, characterized in that said substrate is a laminate which comprises a support and a glass layer, said glass layer having a thickness of less than 700 .mu.m. The support is preferably a plastic foil. The laminate has the combined benefits of low weight and high strength and is therefore a suitable substrate for making flat panel displays such as liquid crystal displays, plasma displays, field emission displays or organic light-emitting polymer displays. Preferred examples of the functional layer are e.g. electroconductive layers, liquid crystal orientation layers, color filters, electroluminescent layers, passivation layers and phosphor layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.