Cleaner composition, method for making and using same
US6310017A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 1999 |
| Grant date | Oct 30, 2001 |
| Priority date | — |
| Expiry date | Feb 1, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A cleaning solution composition for use on electronic component and equipment employed in the cleaning of these components. The cleaning solution comprises ultrapure water containing carbonic acid plus an oxidizing agent selected from hydrogen peroxide, ozone, and combinations thereof. The invention includes a method of removing contaminants from electronic components, containers and associated equipment using the cleaning solution of novel composition. Further, the invention includes a method of preparing the novel cleaning solution composition by contacting carbon dioxide gas with ultrapure water and adding an oxidizing agent, or by contacting carbon dioxide gas with an ultrapure water solution of oxidizing agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.