Stripping composition for resist
US6310020A · kind A · utility
20Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 25, 1999 |
| Grant date | Oct 30, 2001 |
| Priority date | — |
| Expiry date | Oct 25, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A stripping composition for a resist comprising a polycarboxylic acid and/or a salt thereof, and water, wherein a pH of the stripping composition is less than 8; and a stripping composition for a resist comprising 0.01 to 90% by weight of an organic acid and/or a salt thereof, 2 to 74% by weight of water, and 0.5 to 90% by weight of an organic solvent, wherein a pH of the stripping composition is less than 8; and a method of stripping a resist from a substrate, comprising applying one of the stripping composition to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.