Process and arrangement for monitoring and controlling the treatment parameters in an ophthalmic treatment device
US6312422A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 5, 1999 |
| Grant date | Nov 6, 2001 |
| Priority date | — |
| Expiry date | Mar 5, 2019 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N5/062
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A process for monitoring and controlling the adjustment of treatment parameters in an ophthalmic treatment device which comprises a radiation source generating at least a treatment beam and, optionally, a target beam and an applicator which is connected with the radiation source via at least one optical element and can be attached to a slip lamp, wherein the following steps are provided: a) the irradiation parameters such as intensity, magnification of the contact lens placed on the eye, radiation dose per unit area, and spot size on the retina are adjusted by the operator at the radiation source; b) first parameters to be adjusted at the applicator are calculated on the basis of patient-related influencing variables such as contact lens magnification and the size of the spot to be realized on the retina, so that a determined spot size and intensity of the treatment beam to be applied can be realized at the treatment site on the retina; and c) parameters adjusted at the applicator are compared with the first parameters by means of a computer and the adjusted parameters are made to coincide with the first parameters representing reference values, and the parameters serving as refere…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.