Method and device for processing semiconductor material

US6313013A · kind A · utility

Assignee

• Wacker Chemie AG · DE

Inventors

• Dirk Flottmann · Altötting, DE
• Gerhard Ast · Emmerting, DE
• Reinhard Wolf · Isny im Allgäu, DE

Key dates

• Filing date: Oct 1, 1999
• Grant date: Nov 6, 2001
• Expiry date: Oct 1, 2019

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C30B15/02
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

There are a device and method for protecting semiconductor material, wherein semiconductor material is processed on a surface of stabilized ice made from ultrapure water and particles of semiconductor material.