Technique for measuring resistivity
US6313647A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 1999 |
| Grant date | Nov 6, 2001 |
| Priority date | — |
| Expiry date | Nov 9, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B33/10
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Disclosed is anew technique for measuring the resistivity of ultra-thin carbon films (less than 200 .ANG.). The technique involves using a probe with very smooth surface, a thin layer lubricant (20-30.ANG.)that enables the intimate and stable electrical contact between probe and the thin film, and measurement of I-V curve to determine resistance. Resistivity measurements were conducted on carbon films doped with hydrogen and nitrogen at different mixture ratios and different thicknesses, and the results were compared with those obtained on a commercially available machine that uses a mercury probe. The advantages of the present technique include simple in use, less expensive and quick measurements with reasonably good accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.