Apparatus and method for defining a pattern on a substrate
US6313905A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 1999 |
| Grant date | Nov 6, 2001 |
| Priority date | — |
| Expiry date | Sep 28, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/901
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides an apparatus and a method for defining a pattern on a substrate using a shadow masking technique. Said apparatus comprises a flexible member having a movable portion and at least one aperture. The flexible member is positioned in operation above the substrate thereby acting as a shadow mask. The apparatus further comprises a support for the substrate, distance-controlling means for controlling the distance between said movable portion and said substrate, and an actuator for moving the flexible member and substrate relative to each other parallel to a surface of the substrate. The apparatus further comprises an emission source which emits materials, electrons or light and which aims through the shadow mask at the substrate where the pattern is defined. Such a pattern might be employed in micromechanic, microoptic or microelectronic devices, for example. The described apparatus may be implemented using the AFM principal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.