Developing solution and method of forming polyimide pattern by using the developing solution
US6316170A · kind A · utility
9Cited by
9References
20Claims
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Key dates
| Filing date | Mar 15, 2000 |
| Grant date | Nov 13, 2001 |
| Priority date | — |
| Expiry date | Mar 15, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=-log (Kb)=-log (Kw/Ka)=14-pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=-log (Ka), and Kw is an ion product of water=1.times.10.sup.-14 ] of 5 to 8 within an aqueous solution of 25.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.