System and method for performing low contamination extrusion for microelectronics applications
US6319316A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 17, 1999 |
| Grant date | Nov 20, 2001 |
| Priority date | — |
| Expiry date | Feb 17, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to a system and method for performing accurate coating operations while minimizing contamination of the coating fluid arising from contact between the fluid and the extrusion head. In one embodiment, the extrusion head is composed entirely of non-metallic material, possibly ceramic, thereby minimizing any material removal by the fluid, and any ionic or chemical reaction between the extrusion head material and the fluid. In another embodiment, a shim separating metal parts of an extrusion head is composed of a non-metallic substance to prevent galvanic potential induced corrosion between the shim and the extrusion head material and the resulting release of the products of such corrosion into the coating fluid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.