Patent · US Expired

Fast luminescent silicon

US6319427A · kind A · utility

19Cited by
2References
5Claims
0Family size

Inventors

Key dates

Filing dateFeb 7, 2000
Grant dateNov 20, 2001
Priority date
Expiry dateFeb 7, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/826

Abstract

There are provided mesoporous silica materials containing in their pores stabilized clusters of silicon atoms, of size 2 nanometers or less, and capable of photoluminescence to emit fast photons. They are prepared by chemical vapour deposition of silicon or a silicon precursor such as disilane, under soft conditions such as temperature of 100-150.degree. C., into the mesopores of silicate films which have mesoporous channels prepared by growth of the films using a template to control their sizes, but without removing the template residues from the films prior to the chemical vapour deposition. The template residues serve to limit the size of the silicon clusters which conform. The use of the soft conditions on CVD retains the template residues in an intact, substantially unchanged form. The resultant films have clusters of silicon, of 2 nanometer size or less, anchored to the mesopores, and air stable, so that they can be used in optoelectronic devices in conjunction with standard silicon semiconductors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.