Dissolution inhibition resists for microlithography
US6319648A · kind A · utility
4Cited by
19References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 14, 2000 |
| Grant date | Nov 20, 2001 |
| Priority date | — |
| Expiry date | Jan 14, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Improved dissolution inhibition resists for use in microlithography are disclosed herein. These resists are comprised of phenolic base resin(s) having increased inhibitability and which are suitable for use in resist formulations for microlithography and semiconductor applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.