Optical sensor having dielectric film stack
US6320991A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 16, 1998 |
| Grant date | Nov 20, 2001 |
| Priority date | — |
| Expiry date | Oct 16, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/552
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for optically assaying a targeted substance in a sample using a sensor comprising a dielectric film stack having a plurality of dielectric layers. For at least one angle of incidence the dielectric layers operate as a waveguide for light incident upon the sensor. In one configuration, each dielectric layer comprises a dielectric material selected from a first dielectric material having a first index of refraction and a second dielectric material having a second index of refraction. The dielectric film stack is formed such that the dielectric material of the dielectric layers alternates between the first dielectric material and the second dielectric material. The dielectric film stack is either formed as a dielectric mirror such that light incident upon the sensor reflects from the sensor or as an anti-reflection film stack such that light incident upon the light beam propagates through the sensor. The inventive sensor exhibits a resonance that is comparable in magnitude with resonances commonly exhibited by conventional SPR sensors. However, unlike grating-based SPR sensors, the inventive sensor allows a sample to be assayed with substrate-incident light such…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.