Method and apparatus to produce large inductive plasma for plasma processing
US6321681A · kind A · utility
14Cited by
8References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1999 |
| Grant date | Nov 27, 2001 |
| Priority date | — |
| Expiry date | Sep 20, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32623
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus comprises a processing chamber having at least one opening for receiving field energy by inductive coupling, and at least one field energy source arranged to induce the field energy into the chamber via the corresponding opening. The field energy source comprises an inductor device associated with a magnetic core. The magnetic core forms a closure and gas seal for the corresponding opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.