Patent · US Expired

Manufacture of high purity benzene and para-rich xylenes by combining aromatization and selective disproportionation of impure toluene

US6323381A · kind A · utility

16Cited by

9References

19Claims

0Family size

Assignee

Chevron Corporation · US

Inventors

Gerald J. Nacamuli · Mill Valley, US
Robert A. Innes · San Rafael, US
Arnold J. Gloyn · Walnut Creek, US

Key dates

Filing date	Jul 12, 1994
Grant date	Nov 27, 2001
Priority date	—
Expiry date	Jul 12, 2014

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC10G35/095
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

A process is set forth for reacting impure toluene to obtain benzene, toluene and a para-rich xylene stream, which are substantially free of close-boiling non-aromatics. The impure toluene comprises at least 70 wt % toluene and between about 0.2 wt % and about 5 wt % close-boiling non-aromatics. The process may also comprise aromatizing a naphtha over a non-acidic catalyst. The impure toluene from the aromatization step is passed over an acidic intermediate pore zeolite to produce a para-rich xylene stream and chemically pure benzene.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.