Machine for exposing a panel to laser radiation
US6323936A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2000 |
| Grant date | Nov 27, 2001 |
| Priority date | — |
| Expiry date | Oct 16, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0026
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The invention relates to a machine for exposing a panel to laser radiation, said panel having a working length L in a first direction Y, and being subdivided into N successive segments. The machine has a fixed structure; a horizontal panel support that is movable relative to the structure; device for generating and modulating N laser beams; and N optical units which are fixed relative to the structure. Each optical unit has deflector device for generating a continuously deflected beam, and a mirror for directing the deflected beam towards the panel, the length l.sub.1 of the mirror being greater than L/N. The optical units are organized as two sets, with the units in any one set being juxtaposed so that their mirrors are substantially in alignment along the Y direction, the distance in the Y direction between the optical axes of two juxtaposed optical units in the same set being equal to 2L/N and the distance in the Y direction between the optical axis of a unit in one set and the optical axis of an optical unit in the other set that is closest thereto being equal to L/N, thereby enabling the deflected laser beam from one optical unit to scan a length l.sub.1 that is longer than th…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.