Position alignment system for holographic lithography process
US6329104A · kind A · utility
5Cited by
10References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 1999 |
| Grant date | Dec 11, 2001 |
| Priority date | — |
| Expiry date | Mar 2, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Lithography processes that use multiple layers require registration between layers. The accuracy requirement depends on the application of the lithograph. For microlithography, the registration requirement could be less than one micron. Systems that use lenses for imaging such as optical steppers can image conventional alignment marks through those lenses. A unique microlithography system that employs holograms has properties that are not compatible with known alignment techniques. The present invention is a new system for alignment of holographic microlithography elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.