Method of manufacturing thin film magnetic head
US6329211A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 1999 |
| Grant date | Dec 11, 2001 |
| Priority date | — |
| Expiry date | Sep 27, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49046
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A first magnetic film to constitute a first yoke part and a first pole part is formed in a given pattern on a substrate, and a write gap film is formed on the part corresponding to the first pole portion of the first magnetic film. Then, a second magnetic film having a second pole portion and a second yoke part is formed on the write gap film by a photolithography so that the second pole portion can have a width of 1.5-2.5 .mu.m. Thereafter, the sides of the second pole portion are etched by an ion beam etching method to narrow its width, and the write gap film is removed by using, as a mask, the second pole portion to expose the first magnetic film. Subsequently, the exposed first magnetic film is partially removed to form the first pole portion and thereby a thin film magnetic head having a pole portion with a track width of not more than 1 .mu.m beyond the limit of the photolithography is produced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.