Film or coating deposition and powder formation
US6331330A · kind A · utility
39Cited by
3References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 15, 1998 |
| Grant date | Dec 18, 2001 |
| Priority date | — |
| Expiry date | Jun 15, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T50/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods for depositing a material onto a substrate include the steps of: feeding a material solution including one or more precursor compounds, a solvent and a pH-modifying catalyst to an outlet to provide a stream of droplets of the material solution; generating an electric field to electrostatically attract the droplets from the outlet towards the substrate; and providing an increase in temperature between the outlet and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.