Process for depositing diamond-like carbon films by cathodic arc evaporation
US6331332A · kind A · utility
Inventor
Key dates
| Filing date | Nov 5, 1999 |
| Grant date | Dec 18, 2001 |
| Priority date | — |
| Expiry date | Nov 5, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32055
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In accordance with the present invention, there is provided a process for depositing diamond-like carbon (DLC) films by cathodic arc evaporation (CAE), wherein the high energy of CAE metal ions causes the cracking reaction of the hydrocarbon gases fed into the vacuum reaction chamber and then results in the deposition of DLC films having high hardness and lubrication. Due to the metallic constituents doped in the DLC films, the films also have good toughness. Moreover, prior to the feeding of hydrocarbon gases for the DLC deposition, the same metal arc source may deposits one or more interlayers of metal, metal nitride, or metal carbide on the substrate so as to further enhance the adhesion of the DLC films to be deposited.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.