Organic-solvent-based photocurable resist composition and resist pattern-forming method
US6331376A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2000 |
| Grant date | Dec 18, 2001 |
| Priority date | — |
| Expiry date | Jul 5, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0388
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B--[X].sub.n [Y].sub.m --B, where X is represented by the formula: ##STR1## and Y is represented by the formula: --OOCHN--A--NHCOO(R.sub.2)--, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R.sub.1 is a structural unit derived from a carboxyl group-containing polyol compound, R.sub.2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.