Large aperture optical image shutter
US6331911A · kind A · utility
81Cited by
4References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2000 |
| Grant date | Dec 18, 2001 |
| Priority date | — |
| Expiry date | Aug 4, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/122
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An optical image shutter is provided having a multiplicity of thin layers of alternating narrow and wide gap semiconductor material stacked to form an MQW structure and electrodes located on at least two semiconductor surfaces of the image shutter, wherein the electrodes are configured so that a voltage difference applied between them produces an electric field that is temporally and spatially substantially uniform in the volume of the MQW structure and wherein the aperture of the image shutter is greater than 4 square mm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.